منابع مشابه
Fundamentals of Wettability
For help in preparation of this article, thanks to Austin Boyd, Gabriela Leu and Romain Prioul, Boston; Ray Kennedy, Edmonton; Patrice Ligneul, Dhahran, Saudi Arabia; John McCullagh, Sugar Land, Texas, USA; Guillemette Picard, Clamart, France; Raghu Ramamoorthy, Abu Dhabi, UAE; and Alan Sibbit, Moscow. Thanks also to the participants of the May 2007 Schlumberger Wettability Workshop, Bahrain. E...
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There are many studies in literature concerning contact angle measurements on different materials/substrates. It is documented that textiles can be coated with multifunctional materials in form of thin films or nanoparticles to acquire character‐ istics that can improve the protection and comfort of the wearer. The capacity of oxide nanostructures to inhibit fungal development and neutralize ba...
متن کاملWettability Patterning
microfabrication applications, it is widely used to transfer the designed patterns from an etching mask to the substrate. When the sample is immersed into the etching bath, the etchant only contacts and reacts with the substrate surfaces where are uncovered by the etching mask. The suitable materials for the mask can be polymers or other materials such as photoresist, SU-8,SiO2 andSi3N4, which ...
متن کاملWettability of partially suspended graphene.
The dependence of the wettability of graphene on the nature of the underlying substrate remains only partially understood. Here, we systematically investigate the role of liquid-substrate interactions on the wettability of graphene by varying the area fraction of suspended graphene from 0 to 95% by means of nanotextured substrates. We find that completely suspended graphene exhibits the highest...
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Silicon gravure patterns are engineered to have cells that are wettable and lands that are not wettable by aqueous inks. This strategy allows excess ink on the lands to be removed without using a doctor blade. Using an aqueous silica ink, continuous lines as narrow as 1.2 μm with 1.5 μm space are gravure printed.
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ژورنال
عنوان ژورنال: The Journal of the Society of Chemical Industry, Japan
سال: 1969
ISSN: 0023-2734,2185-0860
DOI: 10.1246/nikkashi1898.72.11_2451